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In this paper, we implemented the GPU-based calculation of the p-n junction diode current simulation in the multiple parameter space. In particular, the parameter space is chosen as external voltage, diffusion coefficient and lengths. The GPU-based simulation has achieved the 2 times speedup compared to the CPU mode.
We choose binary inorganic compound MoS2 for a p-n junction. Chemical structure simple molecular lattice is simulated by a program called a VESTA. We took MoS2 total length of the channel is 20 nm.
If we give V potential in p-n junction electron chemical potential difference will be μ_l-μ_R=q_V. Density of state will be increased from the external voltage influence (Picture 1 Graph of Density of State) therefor change will be occurring in the density of electron charge.
The Poisson equation for a band bending in the depletion region given by following expression:
(d2φ(x))/dx2=-e/ϵ_s (p-n+N_D-N_A )
In this case depletion region defined as:
{█(p_(n (x)=) p_n+A e^(-x/L_p )+B e^(x/L_p ) (x>x_n0)@p_(n (x)=) p_n+C e^(-x/L_p )+D e^(x/L_p ) (x<-x_p0))┤
And finally we will find from Shockley (or diode) equation total current:
J_p (x_n0 )=Q_p/〖Aτ〗_p =e D_p/L_p p_n0 (e^(eV_a/〖(k〗_B T))-1)
We took three parameters:
L_p- diffusion length
p_n0- carrier densities
V_a- external voltage
to change the value in determining range to find the I(V) characteristic of p-n junction. This work allows calculating the current simulation in the accuracy of nano-meter scale.